Exhibition Participation
Posted: 02/11/2019
Posted by: Association of Print Scholars
Expires: 03/09/2019
12th Biennial International Miniature Print Competition 2019
Center for Contemporary Printmaking
Norwalk,
CT, United States
06/02/2019 to
08/25/2019
Submissions due: 03/09/2019
The Center for Contemporary Printmaking is delighted to announce the 12th Biennial International Miniature Print Competition and Exhibition. This juried competition and exhibition, limited to works that are no more than four square inches (25.8 square cm), encourages artists to explore the miniature print format and provides them with an opportunity for exhibition. It is also an opportunity for artists and the public to view the current concerns of printmakers from around the world. Since its inception in 1997, the competition has attracted entries by more than 1500 artists from around the world and across the U.S.A.
The International Miniature Print Competition is held every other year, alternating with CCP’s other biennial, FootPrint International (for prints measuring exactly 12 x 12 in. square).
ENTRY DEADLINE:
March 8, 2019 (postmark)
JURY NOTIFICATION:
April 6, 2019
JUROR: Tomas Vu-Daniel, Artistic Director for LeRoy Neiman Center for Print Studies at Columbia University
Tomas Vu-Daniel received a BFA from the University of Texas, El Paso, and went on to earn an MFA from Yale University. He has been a professor at Columbia University School of the Arts since 1996, when he helped found the LeRoy Neiman Center for Print Studies. In 2000, he was appointed the LeRoy Neiman Professor of Visual Arts. Since its inception, VuDaniel has served as Director/Artistic Director of the Neiman center. Vu-Daniel has exhibited nationally and internationally and has had solo museum shows in Japan, Italy, China, and Vietnam. Vu-Daniel currently lives and works in New York City.
EXHIBITION DATES:
June 2 – August 25, 2019
Opening Reception: Sunday, June 2, 2019, 2:00 - 4:00 pm
ABOUT CCP:
The Center for Contemporary Printmaking is a nonprofit printmaking studio and gallery dedicated to the art of the print.
At CCP artists can work independently, collaborate with master printers, or enroll in workshops conducted by nationally
recognized artists. We provide studios, equipment, and technical expertise. Exhibitions of original prints are held regularly
in the gallery, and diverse educational programs are offered for experienced and emerging artists.
Please visit the 'External Link' below for more information, including copies of the MiniPrint competition prospectus (available in English and Spanish).
The International Miniature Print Competition is held every other year, alternating with CCP’s other biennial, FootPrint International (for prints measuring exactly 12 x 12 in. square).
ENTRY DEADLINE:
March 8, 2019 (postmark)
JURY NOTIFICATION:
April 6, 2019
JUROR: Tomas Vu-Daniel, Artistic Director for LeRoy Neiman Center for Print Studies at Columbia University
Tomas Vu-Daniel received a BFA from the University of Texas, El Paso, and went on to earn an MFA from Yale University. He has been a professor at Columbia University School of the Arts since 1996, when he helped found the LeRoy Neiman Center for Print Studies. In 2000, he was appointed the LeRoy Neiman Professor of Visual Arts. Since its inception, VuDaniel has served as Director/Artistic Director of the Neiman center. Vu-Daniel has exhibited nationally and internationally and has had solo museum shows in Japan, Italy, China, and Vietnam. Vu-Daniel currently lives and works in New York City.
EXHIBITION DATES:
June 2 – August 25, 2019
Opening Reception: Sunday, June 2, 2019, 2:00 - 4:00 pm
ABOUT CCP:
The Center for Contemporary Printmaking is a nonprofit printmaking studio and gallery dedicated to the art of the print.
At CCP artists can work independently, collaborate with master printers, or enroll in workshops conducted by nationally
recognized artists. We provide studios, equipment, and technical expertise. Exhibitions of original prints are held regularly
in the gallery, and diverse educational programs are offered for experienced and emerging artists.
Please visit the 'External Link' below for more information, including copies of the MiniPrint competition prospectus (available in English and Spanish).
Relevant research areas: North America, Contemporary, Engraving, Etching, Letterpress, Lithography, Monoprinting, Papermaking, Relief printing, Screenprinting