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Call for Applications: Studio Immersion Project Fellowship The Elizabeth Foundation for the Arts/ Robert Blackburn Printmaking Workshop

The Studio Immersion Project (SIP) at The Elizabeth Foundation for the Arts/ Robert Blackburn Printmaking Workshop is an intensive 3 month studio fellowship designed to immerse artists in the world of printmaking. SIP Fellows will acquire new techniques and build upon existing skills. Artists, from all media, interested in making printmaking a regular part of their creative practice are invited to apply. All applications are due by 13 March.


SIP Award Description
1 year EFA RBPMW membership
3 months unlimited EFA RBPMW studio access
Monthly stipend
Materials stipend
6 session SIP Orientation Program
Includes: In depth studio orientation, basic intaglio, lithography, screenprinting, relief and monotype techniques.
3 EFA RBPMW classes picked from Summer Class Schedule
Group exhibition in 20|20 Gallery the summer after fellowship year
Scheduled project consultation with EFA RBPMW staff printers
3 month material & supply storage
Access to exhibition and portfolio exchange opportunities through EFA RBPMW membership

Selection Process
Selection is based on artistic merit determined by an independent three person interdisciplinary panel in a blind jury. Jurors will be made public following the announcement of selected participants.

SIP Eligibility
A SIP fellowship is ideal for artists with a developed studio practice and career experience. Prior printmaking experience is not required. Artists working in other media are strongly encouraged to apply. Applicants cannot have an affiliation with any institution as a full or part time student at the time of application. Applicants cannot have received any other fellowship from EFA RBPMW in the past 2 years.

Eligibility is limited to artists living and working in New York State. Artists must be able to spend a minimum of 20 hours working in the studio each week for the three month SIP period. Artists must be able attend all sessions of SIP Orientation.


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